@article{ISI:000259794100079,
 abstract = {A modified electron-beam-induced deposition method using a parallel beam
of electrons is developed. The method relies on the buildup of surface
potential on an insulating surface exposed to an electron beam. Presence
of sharp edges on the insulating surface implies presence of large
electric fields that lead to site-specific nucleation of metal vapor on
those regions. Feature sizes as small as 20 nm can be deposited without
the need to use fine probes, and thus the limitation of probe size
imposed on the resolution is overcome. The use of pure metal vapor also
renders the process inherently clean. (C) 2008 American Institute of
Physics.},
 article-number = {133104},
 author = {Basu, Joysurya and Carter, C. Barry and Divakar, R. and Shenoy, Vijay B.
and Ravishankar, N.},
 doi = {10.1063/1.2992193},
 eissn = {1077-3118},
 issn = {0003-6951},
 journal = {APPLIED PHYSICS LETTERS},
 month = {SEP 29},
 number = {13},
 orcid-numbers = {Ramachandran, Divakar/0000-0001-5641-4673
Carter, C. Barry/0000-0003-4251-9102
Narayanan, Ravishankar/0000-0003-0012-046X
Basu, Joysurya/0000-0001-5155-2620},
 researcherid-numbers = {Ramachandran, Divakar/D-4212-2011
Basu, Joysurya/A-8398-2009
Carter, C. Barry/E-6478-2010
Narayanan, Ravishankar/Q-2453-2019
Narayanan, Ravishankar/G-4866-2010
},
 times-cited = {10},
 title = {Modified electron-beam-induced deposition of metal nanostructure arrays
using a parallel electron beam},
 unique-id = {ISI:000259794100079},
 volume = {93},
 year = {2008}
}